Our group’s research spans a wide range of advanced materials processing and device fabrication techniques for energy applications such as high temperature superconducting thin film tapes and photovoltaics as well as for flexible electronics. A key capability of our group is single-crystalline-like thin films of various materials on inexpensive, flexible substrates by roll-to-roll processing. Epitaxial growth of oxides, nitrides, silicides, arsenides, phosphides, germanium, silicon and compound semiconductors on lattice mismatched, practical substrates is large emphasis of our research. A variety of thin film process technologies such as metal organic chemical vapor deposition (MOCVD), ion beam assisted deposition (IBAD), magnetron sputtering, e-beam evaporation, inkjet printing and solution coating are being employed. Unique, state-of-the-art equipment for thin film and bulk materials processing, electromagnetic characterization at high magnetic fields and low temperatures, as well as semiconductor property measurements are available in our laboratories.
